Horizontal Diffusion Furnace

LPCVD Furnace

PECVD Furnace

Equipment for Solar Cell Production

Ultra High Purity Gas Delivery Systems

External Burn System

Chemical Control Panel and Precursor Temperature Controller

Control System SVconCS


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Horizontal PECVD Furnace for High Process Performance

The design of the SVCS Plasma Enhanced Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system (SVpFUR-FP) and high flexibility small scale versions for use in research and pilot production (SVpFUR-RD). It provides an easy-to-maintain, safe and reliable horizontal furnace platform. The SVCS design is outstanding for high efficiency, minimised footprint and low cost of ownership while offering high process flexibility.


  • Silicon nitride (including anti-reflective SiN solar cell coating)
  • Silicon oxide
  • Oxinitride 



  • State-of-the-art modular control system; in-house designed, highly tailored and in-house manufactured
  • Top notch components always selected for excellent results and tr ouble free long life of the furnace equipment
  • Up to 4 stacked quartz tube reactor chambers for various procesess
  • Multiple methods of v acuum control, heated or unheated

    -Throttling Butterfly Valve – TBV

    -N₂ ballast

    -Vacuum pump control with frequency converter

  • Integration of vacuum pump system in cooperation with leading vacuum pump manufacturer
  • Advanced water cooling tube level system:  no thermal interference between different tubes
  • On request integration of RF generators in cooperation with leading manufacturers
  • Proprietary designed water cooled flanges
  • Proprietary inhouse manufactured RF generators
  • Proprietary designed inhouse assembled graphite wafer carriers
  • Contactless fully automated boat-in-tube loading cantilever with proprietary ceramic incapsulated twin rod system
  • Maintenance friendly mechanical design



Wafer size   150 mm, 200 mm or any custom size
Wafer load FP: up to 120
  RD: 25 (typical)
Heating system   3 or 5 zone
Flat zone  FP: up to 1067 mm (42")
  RD: down to 300 mm(12")
  ± 0.5°C across flat zone
Process temperature 200°C to 800°C
Power consumption   80 kW – 150kW depending on tube configuration
Power supply 150 mm: 3-phase, 400 or 480VAC, 140 A, 50 or 60 Hz
  200 mm: 3-phase, 400 or 480VAC, 160A, 60Hz
  (system is always adapted to country - specific power supply network)
Clean dry air 70 – 110 psig (4,8 to 7,6 bar)
Cooling water 40 - 60 LPM
Exhaust  210 m³/h per tube

Boat elevator and wafer handling automation