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Horizontal Diffusion Furnace

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Equipment for Solar Cell Production

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External Burn System

Chemical Control Panel and Precursor Temperature Controller

Control System SVconCS

 

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Horizontal PECVD Furnace for High Process Performance

The design of the SVCS Plasma Enhanced Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system (SVpFUR-FP) and high flexibility small scale versions for use in research and pilot production (SVpFUR-RD). It provides an easy-to-maintain, safe and reliable horizontal furnace platform. The SVCS design is outstanding for high efficiency, minimised footprint and low cost of ownership while offering high process flexibility.

PECVD PROCESSES

  • Silicon nitride (including anti-reflective SiN solar cell coating)
  • Silicon oxide
  • Oxinitride 

 

FEATURES AND BENEFITS

  • State-of-the-art modular control system; in-house designed, highly tailored and in-house manufactured
  • Top notch components always selected for excellent results and tr ouble free long life of the furnace equipment
  • Up to 4 stacked quartz tube reactor chambers for various procesess
  • Multiple methods of v acuum control, heated or unheated

    -Throttling Butterfly Valve – TBV

    -N₂ ballast

    -Vacuum pump control with frequency converter

  • Integration of vacuum pump system in cooperation with leading vacuum pump manufacturer
  • Advanced water cooling tube level system:  no thermal interference between different tubes
  • On request integration of RF generators in cooperation with leading manufacturers
  • Proprietary designed water cooled flanges
  • Proprietary inhouse manufactured RF generators
  • Proprietary designed inhouse assembled graphite wafer carriers
  • Contactless fully automated boat-in-tube loading cantilever with proprietary ceramic incapsulated twin rod system
  • Maintenance friendly mechanical design

TECHNICAL DATA

 

Wafer size   150 mm, 200 mm or any custom size
Wafer load FP: up to 120
  RD: 25 (typical)
Heating system   3 or 5 zone
Flat zone  FP: up to 1067 mm (42")
  RD: down to 300 mm(12")
  ± 0.5°C across flat zone
Process temperature 200°C to 800°C
Power consumption   80 kW – 150kW depending on tube configuration
Power supply 150 mm: 3-phase, 400 or 480VAC, 140 A, 50 or 60 Hz
  200 mm: 3-phase, 400 or 480VAC, 160A, 60Hz
  (system is always adapted to country - specific power supply network)
Clean dry air 70 – 110 psig (4,8 to 7,6 bar)
Cooling water 40 - 60 LPM
Exhaust  210 m³/h per tube
   
Options   

Boat elevator and wafer handling automation