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Horizontal Diffusion Furnace

LPCVD Furnace

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External Burn System

Chemical Control Panel and Precursor Temperature Controller

Control System SVconCS

 

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Horizontal LPCVD Furnace for High Process Performance

The design of the SVCS Low Pressure Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system (SVcFUR-FP) and high flexibility small scale versions for use in research and pilot production (SVcFUR-RD). It provides an easy-to-maintain, safe and reliable horizontal furnace platform. The SVCS design is outstanding for high efficiency, minimised footprint and low cost of ownership while offering high process flexibility.

 

LPCVD Processes

  • Silicon nitride
  • Low temperature oxide (LTO)
  • High temperature oxide (HTO)
  • TEOS oxide
  • Polysilicon, both with tilt and flat temperature profile
  • Doped polysilicon
  • Oxynitride

   

Features and Benefits

  • State of the art modular control system; in-house designed, highly tailored and in-house manufactured
  • Top notch components always selected for excellent results and trouble free long life of the furnace equipment
  • Up to 4 stacked quartz  tube reactor chambers for various procesess
  • Multiple methods of vacuum control, heated or unheated

    -Throttling Butterfly Valve – TBV

    -N ballast

    -Vacuum pump control with frequency converter

  • Integration of vacuum pump system in cooperation with leading vacuum pump manufacturers
  • Advanced water cooling tube level system: no thermal interference between different tubes
  • Proprietary designed water cooled flanges
  • Contactless fully automated boat-in-tube loading both cantilever or softloading configurations
  • Maintenance friendly mechanical design

 

Technical Data

 

Wafer size 150mm, 200 mm or any custom size
Wafer load FP: 100+
  RD: 25 (typical)
Heating system 3 or 5 zone
Flat zone FP: up to 1067 mm (42")
  RD: down to 300 mm(12")
  ア 0.5ーC across flat zone
Process temperature 200ーC to 1200ーC
Power consumption 80kW ・ 150kW depending on tube configuration
Power supply 150 mm: 3-phase, 400 or 480VAC, 140 A, 50 or 60 Hz
  200 mm: 3-phase, 400 or 480VAC, 160A, 60Hz
  (system is always adapted to country- specific power supply network)
Clean dry air 70 ・ 110 psig (4,8 to 7,6 bar)
Cooling water 40 - 60 LPM
Exhaust  210m³/h per tube
   
Options Boat elevator and wafer handling automation